Stanford Materials Corporation (SMC) offers high-purity Holmium Planar Sputtering Targets (99.9%–99.99%) for advanced thin-film applications. With fine grain structure (<50 µm) and over 95% theoretical density, these targets ensure clean sputtering, strong adhesion, and uniform film growth.
SMC offers high-purity Holmium Planar Sputtering Targets (99.9%–99.99%) for advanced thin-film applications. With fine grain structure (<50 µm) and over 95% theoretical density, these targets ensure clean sputtering, strong adhesion, and uniform film growth.
Diameter: 50–200 mm
Thickness: 3–10 mm
Custom shapes and bonded backing plates (Cu, Mo, Ti) available
Low particle generation
Strong oxidation resistance (argon-sealed packaging)
Fully tested: ICP-MS, XRD, roughness <0.5 µm
ISO 9001 / ASTM F3091 compliant
3–4 week standard delivery worldwide
Magnets & Spintronics: Ho-based magnetic films for sensors and memory
Laser Coatings: Mid-IR Ho:YAG laser films
Nuclear Systems: Ho-165 coatings for neutron absorption
Quantum Devices: Films for superconductors and magnetocaloric cooling
Aerospace Coatings: Wear-resistant layers for extreme temperatures
PP boxes for small items
Custom wooden crates for large targets
All targets vacuum-sealed in argon
RF power: 100–300 W
Ar pressure: 2–5 mTorr
Substrate temp: 200–400°C
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