We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.
Cerium Sputtering Target Description
Stanford Materials Corporation (SMC) specializes in supplying high quality sputtering targets. SMC can offers a full line of sputtering targets with various compositions from industrial grade to super high purity. Our standard Sputtering Targets for thin film are available monoblock or bonded with dimensions and configurations up to 820 mm to work with both older sputtering devises as well as the latest process equipment. Quality is assured by our end-to-end quality control process, from powder synthesis, through densification, machining, bonding and full characterization.
Cerium sputtering target has the following applications:
• Use to manufacture aluminum alloys and in some steels and irons.
• In cast iron, opposes graphitization and produces a malleable iron
• In steels, it removes sulfides and oxides and completely detoxifies.
• In stainless steel, it is used as a precipitation-hardening agent.
SMC’s cerium sputtering targets are available in various forms, purities, sizes, and prices. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.