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ST0191 Tantalum Oxide (Ta2O5) Sputtering Targets
  • Catalog No.ST0191
  • Chemical FormulaTa2O5
  • CAS Number1314-61-0
  • Purity99.9%, 99.95%, 99.99%
  • ShapeDiscs, Plates, Column Targets, Step Targets, Custom-made

The tantalum oxide sputtering target is available in various forms, purities, sizes, and prices. Stanford Materials (SMC) offers high-quality tantalum oxide sputter targets at the most competitive prices.

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sc/1670836622-normal-tantalum-oxide-sputter-target.jpg

Tantalum Oxide (Ta2O5) Sputtering Targets Description

As the leading supplier of planar and rotary sputtering targets, Stanford Materials Corporation (SMC) offers innovative solutions for optimal sputtering results and an efficient coating process. Many years of experience in manufacturing metal and alloy products allow SMC to meet our customers increasing requirements with respect to purity, grain structure, density, and target geometry. We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies.

Tantalum Oxide (Ta2O5) Sputtering Targets Specification

Purity 99.9%, 99.95%, 99.99%
Shape Disc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
Size Circular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm

 

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