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ST0211 Germanium Nitride (Ge3N4) Sputtering Targets
  • Catalog No.ST0211
  • Chemical FormulaGe3N4
  • CAS Number12065-36-0
  • Purity99.9%
  • ShapeDiscs, Plates, Column Targets, Step Targets, Custom-made

The germanium nitride sputtering target is available in various forms, purities, sizes, and prices. Stanford Materials Corporation (SMC) offers high-quality germanium nitride sputter targets at the most competitive prices.

 

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Germanium Nitride Sputtering Target Description

Germanium Nitride sputtering target from Stanford Materials Corporation (SMC) is a nitride ceramic sputtering material with the formula Ge3N4.

Purity 99.9%
Shape Disc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
Size Circular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm

Germanium Nitride Sputtering Target Application

The germanium nitride sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Germanium Nitride Sputtering Target Packaging

Our germanium nitride sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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