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ST0001 Aluminum Sputtering Target
  • Catalog No.ST0001
  • Chemical FormulaAl
  • CAS Number7429-90-5
  • Purity99.99%, 99.999%
  • ShapeDiscs, Plates, Column Targets, Step Targets, Custom-made

Aluminum sputtering target is available in various forms, purities, sizes, and prices. Stanford Materials Corporation (SMC) is your one-stop source to find aluminum sputter targets for sale.



Aluminum Sputtering Target Description

Aluminum metal is highly reactive, so pure aluminum is rare under natural conditions and is limited to extremely reducing environments. Aluminum was found to be combined with more than 270 different minerals, and the main ore of aluminum is bauxite, which consists largely of hydrated alumina with variable proportions of iron oxides. Aluminum layers form a reflective coating found on telescopes, automotive headlamps, mirrors, packages, and toys.

Aluminum Sputtering Target Specification

Material Type Aluminum
Symbol Al
Color/Appearance Silvery, Metallic
Melting Point 660°C
Density 2700 kg/m3
Sputter DC
Type of Bond Indium, Elastomer
Comments Alloys W/Mo/Ta. Flash evap or use BN crucible
Available Sizes Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

Aluminum Sputtering Target Application

Aluminum has good thermal properties and is malleable and ductile. Aluminum and its alloy are widely used for various applications including aircraft assemblies and engine parts. The aluminum sputtering target is used for thin film deposition, typically for fuel cells, decoration, semiconductors, displays, LED and photovoltaic devices, glass coating, etc.

Aluminum Sputtering Target Manufacturing processes

  • Production and purification of aluminum

Aluminum is obtained by extracting Al2Ofrom bauxite and then electrolyzing Al2O3 in molten cryolite. The purity of aluminum obtained by this method is generally above 99%, but it still cannot be a raw material for producing aluminum sputter targets. The first and most important requirement of the target is high purity. The high-purity aluminum used in the aluminum targets is produced by the segregation method, three-layer electrolysis method or combined regional melting method. Thus it is much more expensive than industrial pure aluminum. SMC provides aluminum targets of high quality and at a competitive price.

  • Deformation treatment of aluminum sputtering target

As a raw material, a high-purity aluminum ingot is forged, rolled, and heated, so that the crystal grains in the aluminum ingot are fined and the density is increased to meet the requirements of the Al sputter target required for sputtering. Then, the deformed high-purity aluminum material is processed into a target size required for the vacuum coater. The requirements for Al target processing are high precision and high surface quality.

Aluminum Sputtering Target Packing

Our aluminum sputter targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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