Silicon (Si) (N-Type, Resistivity < 0.1 ohm-cm) Sputtering Target

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As the leading supplier of planar and rotary sputtering targets, Stanford Materials Corporation (SMC) offers innovative solutions for optimal sputtering results and an efficient coating process. We can provide various sputtering targets to fit all commercially available systems or to specific dimensions required for your particular applications. Quality is assured by our end-to-end quality control process, from powder synthesis, through densification, machining, bonding and full characterization.

Purity99.9%, 99.95%, 99.99%, 99.995%, 99.999%
ShapeDisc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
SizeCircular: Diameter < 14inch, Thickness > Block: Length < 32inch, Width < 12inch, Thickness > 1mm