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ST0227 Silicon Carbide (SiC) Sputtering Targets
  • Catalog No.ST0227
  • Chemical FormulaSiC
  • CAS Number409-21-2
  • Purity99.5%
  • ShapeDiscs, Plates, Column Targets, Step Targets, Custom-made

The silicon carbide sputtering target is available in various forms, purities, sizes, and prices. Stanford Materials (SMC) offers high-quality silicon carbide sputter targets at the most competitive prices.

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Silicon Carbide (SiC) Sputtering Targets Description

Stanford Materials Corporation (SMC) is a leading sputtering target manufacturer in a variety of markets including: semiconductors, Wireless, Photonics, Data Storage, Hybrid/Micro electronics, Memory, and Performance Films. Many years of experience in manufacturing metal and alloy products allow SMC to meet our customers increasing requirements with respect to purity, grain structure, density, and target geometry. We are able to produce targets of rare or less frequently used compositions as well as a wide array of standard items at competitive prices.

Silicon Carbide (SiC) Sputtering Targets Specification

Purity 99.5%
Composition Custom
Shape Disc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
Size Circular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm

 

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