Nickel silicide sputtering target is available in various forms, purities, sizes, and prices. Stanford Materials Corporation (SMC) offers high quality NiSi2 sputtering targets at the most competitive price.
Nickel silicide sputtering target is a type of silicide ceramic sputtering target composed of nickel and silicon.
The nickel silicide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Our nickel silicide sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
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