GET A QUOTE
** Email address with your company's domain name is preferred. Otherwise, we may not be able to process your inquiry.
ST0113 Titanium Aluminum (Ti/Al) Sputtering Targets
  • Catalog No.ST0113
  • Chemical FormulaTi/Al
  • CAS Number12004-78-3
  • Purity99.9%, 99.95%, 99.99%
  • ShapeDiscs, Plates, Column Targets, Step Targets, Custom-made

The titanium aluminum sputtering target is available in various forms, purities, sizes, and prices. Stanford Materials (SMC) offers high-quality titanium aluminum sputter targets at the most competitive prices.

sc/1670925739-normal-titanium-aluminum-sputter-target.jpg
sc/1670925739-normal-titanium-aluminum-sputter-target.jpg

Titanium Aluminum (Ti/Al) Sputtering Targets Description

Stanford Materials Corporation (SMC) specializes in producing high-purity Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. The unique synergy between our engineering, manufacturing, and analytical teams has allowed us to produce industry-leading sputtering targets.?All materials provided by SMC are furnished with a Certificate of Analysis stipulating the exact purity and trace elements present in the product.

Titanium Aluminum (Ti/Al) Sputtering Targets Specification

Purity 99.9%, 99.95%, 99.99%
Composition Custom
Shape Disc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
Size Circular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm

 

GET A QUOTE
Send us an Inquiry now to find out more Information and the latest prices,thanks!
** Email address with your company's domain name is preferred. Otherwise, we may not be able to process your inquiry.
 Inquiry List
1