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ST0139 Bismuth Titanate Sputtering Target
  • Catalog No.ST0139
  • Chemical FormulaBi4Ti3O12
  • CAS Number12010-77-4
  • Purity99.9%
  • ShapeDiscs, Plates, Column Targets, Step Targets, Custom-made

Stanford Materials Corporation (SMC) provides the best bismuth titanate sputtering target on the market with a competitive price and great delivery time. Customized forms are available upon request.

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Bismuth Titanate Sputtering Target Description

Bismuth titanate sputtering target from Stanford Materials Corporation (SMC) is an oxide sputtering material with the formula Bi4Ti3O12.

Bismuth Titanate Sputtering Target Handling Notes

1. Indium bonding is recommended for the Bi4Ti3O12 sputtering target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.

2. This material has a low thermal conductivity are susceptible to thermal shock.

Bismuth Titanate Sputtering Target Application

The bismuth titanate sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Bismuth Titanate Sputtering Target Packing

Our bismuth titanate sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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