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ST0100 Nickel Chromium Aluminum (Ni/Cr/Al) Sputtering Targets
  • Catalog No.ST0100
  • Chemical FormulaNi/Cr/Al
  • CAS Number7440-02-0 | 7440
  • Purity99.9%, 99.95%
  • ShapeDiscs, Plates, Column Targets, Step Targets, Custom-made

The nickel chromium aluminum sputtering target is available in various forms, purities, sizes, and prices. Stanford Materials Corporation (SMC) offers high-quality nickel chromium aluminum sputter targets at the most competitive prices.

 

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Nickel Chromium Aluminum Sputtering Target Description

The nickel chromium aluminum sputtering target from Stanford Materials Corporation (SMC) is an alloy sputtering material containing Ni, Cr and Al.

Purity 99.9%, 99.95%
Composition Custom
Shape Disc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
Size Circular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm

Nickel Chromium Aluminum Sputtering Target Application

The nickel chromium aluminum sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Nickel Chromium Aluminum Sputtering Target Packing

Our nickel chromium aluminum sputtering targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

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