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ST0307 Gallium Selenide (Ga2Se3) Sputtering Targets
  • Catalog No.ST0307
  • Chemical FormulaGa2Se3
  • CAS Number12024-11-2
  • Purity99.9%, 99.95%, 99.99%, 99.995%, 99.999%
  • ShapeDiscs, Plates, Column Targets, Step Targets, Custom-made

The gallium selenide sputtering target is available in various forms, purities, sizes, and prices. Stanford Materials Corporation (SMC) offers high-quality gallium selenide sputter targets at the most competitive prices.

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Gallium Selenide Sputtering Target Description

Gallium selenide sputtering target is a type of selenide ceramic sputtering target composed of gallium and selenium.

Gallium Selenide Sputtering Target Specification

Compound Formula Ga2Se3
CAS No. 12024-11-2
Density 4.92 g/cm3
Melting Point 1,020 °C
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Gallium Selenide Sputtering Target Application

The gallium selenide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Gallium Selenide Sputtering Target Packing

Our gallium selenide sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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