Stanford Materials (SMC) specializes in producing high-purity Tantalum Oxide. We offer our evaporation materials in powder and granule form. Customized forms are also available upon request.
Tantalum oxide is Ta2O5, also known as tantalum pentoxide. Both orthorhombic and hexagonal phases are known. Tantalum oxide is a high refractive index, low absorption material useful for coatings in the near-UV to IR spectra regions. Tantalum oxide decomposes only at temperatures > 1470 °C.
Tantalum oxide is used to make capacitors in automotive electronics, cell phones, pagers, electronic circuitry, thin-film components, and high-speed tools. In the 1990s, there was a very strong interest to do research on tantalum oxide as a high-k dielectric for DRAM capacitor applications. For example, Elpida Memory has put in a strong effort to improve ultrathin tantalum oxide films for DRAM applications. Subsequently in the 2000s, this strong interest dropped very significantly. There is still some interest to use tantalum oxide in MIM capacitors for RF CMOS integrated circuits. Due to its high index of refraction, tantalum oxide has been utilized in the fabrication of the glass of many photographic lenses.
Tantalum OxideTa2O5CAS#: 1314-61-0, not hazardous, soluble in HFWhite powder, F.W. 441.98, m.p. 1800 °C, Spec. Gravity 8.2 gm/cm3 |
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| Item No. | Description | Purity (Impurities in Oxides) | Lot Size | |
|---|---|---|---|---|
| OX73-3N | Tantalum Oxide Powder Particle size (FSSS): 0.5~2 µm |
Ta2O5 > 99.9% (metals basis) Nb < 0.005%, Fe < 0.005%, Si < 0.002% Ti < 0.002%, Ni < 0.002%, W < 0.003% |
10 kg 50 kg 100 kg |
|
| OX73-4N | Tantalum Oxide Powder Particle size (FSSS): 1~3 µm |
Ta2O5 > 99.99% (metals basis) Nb < 10 ppm, Fe < 10 ppm, Si < 10 ppm Ti < 3 ppm, Ni < 3 ppm, W < 5 ppm |
10 kg 50 kg 100 kg |
|
| OX73-5N | Tantalum Oxide Powder Particle size (FSSS): 1~3 µm |
Ta2O5 > 99.999% (metals basis) Nb < 2 ppm, Fe < 3 ppm, Si < 3 ppm Ti < 1 ppm, Ni < 1 ppm, W < 2 ppm |
10 kg 50 kg 100 kg |
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