Yttrium Oxide Rotatable Sputtering Target

Home » Sputtering Targets » Details


As the leading supplier of planar and rotary sputtering targets, Stanford Materials Corporation (SMC) offers innovative solutions for optimal sputtering results and an efficient coating process. Because of our unique technology and development, SMC can assure consistent and high availability of sputtering targets that meet our customers requirements. Quality is assured by our end-to-end quality control process, from powder synthesis, through densification, machining, bonding and full characterization.


Purity99.9%, 99.95%, 99.99%, 99.995%, 99.999%
ShapeDiscs, Blocks, Tubes, Sheets, Rings, Rods, User specified
SizeOuter Diameter <300mm, Thickness >2mm, Length <350mm