GET A QUOTE
** Email address with your company's domain name is preferred. Otherwise, we may not be able to process your inquiry.
ST0206 Zirconium Oxide (ZrO2, Fully stabilized 8mol% Y2O3) Sputtering Targets
  • Catalog No.ST0206
  • Chemical FormulaZrO2
  • CAS Number1314-23-4
  • Purity99.9%, 99.95%, 99.99%
  • ShapeDiscs, Plates, Column Targets, Step Targets, Custom-made

Zirconium oxide sputtering target is available in various forms, purities, sizes, and prices. Stanford Materials (SMC) provides a wide range of film coating materials with competitive prices and great delivery times.

sc/1670402301-normal-Zirconium Oxide.jpg
sc/1670402301-normal-Zirconium Oxide.jpg

Zirconium Oxide (ZrO2, Fully stabilized 8mol% Y2O3) Sputtering Targets Description

Stanford Materials Corporation (SMC) specializes in producing high-purity Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.

SMC has the capability to manufacture different sputtering target configurations with various production techniques and raw materials to meet sputtering equipment specifications and process requirements. During the past 17 years, we have provided high-quality products for thousands of customers all over the world.

Zirconium Oxide (ZrO2, Fully stabilized 8mol% Y2O3) Sputtering Targets Specification

Purity 99.9%
Composition Custom
Shape Disc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
Size Circular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm

 

GET A QUOTE
Send us an Inquiry now to find out more Information and the latest prices,thanks!
** Email address with your company's domain name is preferred. Otherwise, we may not be able to process your inquiry.
 Inquiry List
1