Ruthenium Rotatable Sputtering Target

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As the leading supplier of planar and rotary sputtering targets, Stanford Materials Corporation (SMC) offers innovative solutions for optimal sputtering results and an efficient coating process. Our standard Sputtering Targets for thin film are available monoblock or bonded with dimensions and configurations up to 820 mm to work with both older sputtering devises as well as the latest process equipment. We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies.


Purity99.9%, 99.95%, 99.99%, 99.995%, 99.999%
ShapeDiscs, Blocks, Tubes, Sheets, Rings, Rods, User specified
SizeOuter Diameter <300mm, Thickness >2mm, Length <350mm