Manganese Oxide Rotatable Sputtering Target

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Stanford Materials Corporation (SMC) provides a full range of sputtering target materials including: precious metals, pure metals, alloys, ceramics, cermets, borides, oxides, carbides, nitrides, silicides, and fluorides. SMC has the capability to manufacture different sputtering target configurations with various production techniques and raw materials to meet sputtering equipment specifications and process requirements. All materials provided by SMC are furnished with a Certificate of Analysis stipulating exact purity and trace elements present in the product.


Purity99.9%, 99.95%, 99.99%, 99.995%, 99.999%
ShapeDiscs, Blocks, Tubes, Sheets, Rings, Rods, User specified
SizeOuter Diameter <300mm, Thickness >2mm, Length <350mm