Magnesium Rotatable Sputtering Targets

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Stanford Materials Corporation (SMC) specializes in producing high purity Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. The unique synergy between our engineering, manufacturing and analytical teams has allowed us to produce industry leading sputtering targets. With a large purchasing and production capacity, SMC can supply sputtering targets with high quality at very competitive prices.


Purity99.9%, 99.95%, 99.99%, 99.995%, 99.999%
ShapeDiscs, Blocks, Tubes, Sheets, Rings, Rods, User specified
SizeOuter Diameter <300mm, Thickness >2mm, Length <350mm