Gallium Oxide Rotatable Sputtering Target

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Stanford Materials Corporation (SMC) specializes in the manufacturer of multi-component sputtering targets of optical, electronic, piezo and ferroelectric, superconductor and fuel cell materials for researchers everywhere. Our standard Sputtering Targets for thin film are available monoblock or bonded with dimensions and configurations up to 820 mm to work with both older sputtering devises as well as the latest process equipment. All materials provided by SMC are furnished with a Certificate of Analysis stipulating exact purity and trace elements present in the product.


Purity99.9%, 99.95%, 99.99%, 99.995%, 99.999%
ShapeDiscs, Blocks, Tubes, Sheets, Rings, Rods, User specified
SizeOuter Diameter <300mm, Thickness >2mm, Length <350mm