The iron oxide sputtering target is available in various forms, purities, sizes, and prices. Stanford Materials Corporation (SMC)offers high-quality iron oxide sputter targets at the most competitive prices.
Iron oxide sputtering target from Stanford Materials Corporation (SMC) is an oxide sputtering material containing Fe and O.
| Material Type | Iron Oxide |
| Compound Formula | Fe2O3 |
| Molecular Weight | 159.69 |
| Appearance | Solid |
| Melting Point | 1566 °C |
| Density | 5.24 g/cm3 |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ |
The iron oxide Fe2O3 sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Our iron oxide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
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