Cobalt Iron Boron Sputtering Target

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Stanford Materials Corporation (SMC) specializes in producing high purity Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. We can provide various sputtering targets to fit all commercially available systems or to specific dimensions required for your particular applications. We are always looking for ways to improve our fabrication techniques in order to supply more value and better products.


Purity99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Composition Custom
ShapeDiscs, Blocks, Tubes, Sheets, Rings, Rods, User specified
SizeCircular: Diameter <250mm, Thickness >1mm; Block: Length <600mm, Width <250mm, Thickness >1mm